Authors

Simone Iadanza, Centre for Advanced Photonics and Process Analysis, Cork Institute of Technology, Cork, Ireland; Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, IrelandFollow
Andrei P. Bakoz, Centre for Advanced Photonics and Process Analysis, Cork Institute of Technology, Cork, Ireland; Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, Ireland
Praveen K. J. Singaravelu, Centre for Advanced Photonics and Process Analysis, Cork Institute of Technology, Cork, Ireland; Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, Ireland
Danilo Panettieri, Centre for Advanced Photonics and Process Analysis, Cork Institute of Technology, Cork, Ireland
Stefan Schulz, Centre for Advanced Photonics and Process Analysis, Cork Institute of Technology, Cork, Ireland; Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, Ireland; Scottish Universities Physics Alliance (SUPA), School of Physics and Astronomy, St. Andrews, UKFollow
Ganga Chinna Rao Devarapu, Centre for Advanced Photonics and Process Analysis, Cork Institute of Technology, Cork, Ireland; Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, IrelandFollow
Sylvain Guerber, STMicroelectronics, Crolles, France
Charles Baudot, STMicroelectronics, Crolles, France
Frédéric Boeuf, STMicroelectronics, Crolles, France
Stephen Hegarty, Centre for Advanced Photonics and Process Analysis, Cork Institute of Technology, Cork, Ireland; Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, IrelandFollow
Liam O'Faolain, Centre for Advanced Photonics and Process Analysis, Cork Institute of Technology, Cork, Ireland; Tyndall National Institute, Lee Maltings, Dyke Parade, Cork, IrelandFollow

ORCID

https://orcid.org/0000-0003-1160-7441

Document Type

Preprint

Disciplines

Optics | Physical Sciences and Mathematics | Physics | Plasma and Beam Physics

Publication Details

Applied Optics, vol. 57, no. 22. © 2018, Optical Society of America. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modifications of the content of this paper are prohibited.

Abstract

In this paper, we show the experimental results of a thermally stable Si3N4 external cavity (SiN EC) laser with high power output and the lowest SiN EC laser threshold to our knowledge. The device consists of a 250 μm sized reflective semiconductor optical amplifier butt-coupled to a passive chip based on a series of Si3N4 Bragg gratings acting as narrow reflectors. A threshold of 12 mA has been achieved, with a typical side-mode suppression ratio of 45 dB and measured power output higher than 3 mW. Furthermore, we achieved a mode-hop free-lasing regime in the range of 15–62 mA and wavelength thermal stability up to 80°C. This solves the challenges related to cavity resonances’ thermal shift and shows the possibility for this device to be integrated in dense wavelength-division multiplexing (WDM) and heat-intensive optical interconnects technologies.

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